top of page
CMP Polishing Slurry — SO-80-PF SiO2 70–90 nm
SiO2 polishing slurry custom reference SO-80-PF, particle range 70–90 nm. HANS RFQ required.
Technical Specifications
Product System
Precision Lapping & Polishing Products
Product Type
Polishing Slurries
Technology
Colloidal Silica CMP Suspension
Bond Type
Grit
Size
Diameter
Width
Length
Thickness
Backing
Mounting
bottom of page